Atomera’s November 2022 IMFEDK Conference Paper Now Available
Jeff Lewis, SVP Business Devt. and Marketing
Atomera’s invited paper at the November IMFEDK 2022 conference is now available from the IEEE. This paper – the seventh Atomera-authored technical paper over the past 2 years – is entitled “Remote Control of Doping Profile, Silicon Interface, and Gate Dielectric Reliability via Oxygen Insertion into Silicon Channel” (H. Takeuchi, et al) and can be accessed along with all of Atomera’s other publications through this link.
This paper sheds light on the physical mechanisms behind MST’s ability to provide precise dopant profile control, a 35% reduction in surface roughness scattering for electron mobility improvement, and a 6X improvement of charge-to breakdown of thin-gate dielectrics, from first principle calculations and 18O tracer experiments. Physics behind MST’s significant impact for HKMG (High-K Metal Gate) to enable a performance boost for the most advanced transistor devices is discussed as well.